Job Description:

• 1) Operates computer-controlled electron-beam exposure equipment to transfer circuit pattern onto photoresist-coated photo mask plates for subsequent use in fabrication of semiconductor devices: Loads disk or tape of pattern information into equipment, and positions unexposed photo mask plate in vacuum chamber of equipment.

• 2) Types commands to enter exposure specifications and production instructions and activate equipment that directs electron beam at specified locations on coated photo mask plate to expose photoresist.

• 3) Develops and etches exposed photo mask plate, using automatic developing and etching equipment.

• 4) Inspects pattern on photo mask plate for conformance to specifications, using microscope and specialized inspection devices.